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| LabVIEW Implementation of Single-Laser Alternating Target Pulsed Laser Deposition |
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| Content: |
Alternating target pulsed laser deposition is a thin-film growth technique used for fabricating complex materials. While it is possible to adapt a standard PLD system to accommodate alternating target PLD, little literature exists to assist in this effort. I have developed a LabVIEW implementation to synchronize and control the necessary components to facilitate alternating target PLD. To test this implementation, we chose to grow thin films of tungsten-doped vanadium dioxide, a material with a metal insulator transition, the temperature of which is linearly dependent on the tungsten doping fraction. By verifying this linear relationship in films grown using this method, the validity of my implementation was confirmed. |
| Id: |
18 |
| Place: |
Science Building Texas Tech University, Physics & Astronomy Department, Box 41051, Lubbock, TX 79409-1051
Room: 103/106 - board #: G1-1 |
| Starting date: |
| 06-Oct-2017 |
14:00 (America/Chicago) |
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| Duration: |
02h00' |
| Primary Authors: |
Mr. ANDREWS, Keller (TTU Physucs) |
| Presenters: |
Mr. ANDREWS, Keller |
| Material: |
 Poster |
| Included in session: |
Group 1 |
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